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Çмú´ëȸ ÇÁ·Î½Ãµù

Ȩ Ȩ > ¿¬±¸¹®Çå > Çмú´ëȸ ÇÁ·Î½Ãµù > Çѱ¹Á¤º¸Åë½ÅÇÐȸ Çмú´ëȸ > 2009³â Ãß°èÇмú´ëȸ

2009³â Ãß°èÇмú´ëȸ

Current Result Document :

ÇѱÛÁ¦¸ñ(Korean Title) Characterization of Nano-Grained ZnO Piezoelectric Thin Films Deposited under Various Sputtering Conditions
¿µ¹®Á¦¸ñ(English Title) Characterization of Nano-Grained ZnO Piezoelectric Thin Films Deposited under Various Sputtering Conditions
ÀúÀÚ(Author) Ruirui Zhang   Eunju Lee   Giwan Yoon  
¿ø¹®¼ö·Ïó(Citation) VOL 13 NO. 02 PP. 0428 ~ 0430 (2009. 10)
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(Korean Abstract)
º» ³í¹®Àº RF ¸¶±×³×Æ®·Ð ½ºÆÛÅ͸µ ½Ã½ºÅÛÀ» ÀÌ¿ëÇÏ¿© p-Si (100) ±âÆÇÀ§¿¡ ÁõÂøµÈ CÃà ¹èÇâÀ» °¡Áö´Â ZnO ¹Ú¸·ÀÇ Æ¯¼ºÀ» ºÐ¼®ÇÏ°í ÀÖ´Ù. ÁõÂø Àü·Â, °øÁ¤ ¾Ð·Â, ¹ÝÀÀ°¡½º·Î »ç¿ëµÈ »ê¼Ò °¡½ºÀÇ ºñÀ²°ú °°Àº ÁõÂø Á¶°ÇµéÀ» º¯È­½ÃÄ×À» ¶§, ZnO ¹Ú¸·ÀÇ °áÁ¤±¸Á¶ÀÇ º¯È­¸¦ ºÐ¼®ÇÑ´Ù. ÁõÂøµÈ ZnO ¹Ú¸·ÀÇ °áÁ¤ ±¸Á¶´Â ÁÖ»ç ÀüÀÚ Çö¹Ì°æ(scanning electron microscope, SEM)À» ÀÌ¿ëÇÏ¿© Á¶»çµÇ¾ú´Ù. ºÐ¼® °á°ú ÁõÂø ÆĶó¹ÌÅ͵éÀº ÁõÂøµÈ ZnO ¹Ú¸·ÀÇ °áÁ¤(grain) Å©±â¿Í ¹èÇâ Ư¼º¿¡ °­ÇÑ ¿µÇâÀ» ¹ÌÄ£´Ù´Â »ç½ÇÀ» ¾Ë ¼ö ÀÖ´Ù.
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(English Abstract)
C-axis-oriented ZnO thin films were successfully deposited on p-Si (100) in an RF magnetron sputtering system. Deposition conditions such as deposition power, working pressure, and oxygen gas ratio were varied. Crystalline structures of the deposited ZnO films were investigated by a scanning electron microscope (SEM) technique. Results show that the deposition parameters can have a strong impact on the preferred orientations and grain sizes of the deposited ZnO films.
Å°¿öµå(Keyword) C-axis orientation   Grain size   RF Magnetron sputtering   ZnO thin film  
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